Inductively Coupled Plasma Deep Reactive Ion Etch
N0017325P0063 · DEPT OF DEFENSE
A SEMICONDUCTOR MACHINERY MANUFACTURING solicitation. AwardCast estimates what this specific solicitation will close for, before you bid.
What's being bought
The awarded contract is a non-competitive, firm-fixed price award to the awardee specified.
Comparable recent awards in SEMICONDUCTOR MACHINERY MANUFACTURING
| Winner | Award value | Offers | Date |
|---|---|---|---|
| INFICON INC | $58K | 1 | 2026-05-26 |
| VACUUM ONE INC | $52K | 36 | 2026-05-14 |
| EBARA TECHNOLOGIES INC | $45K | 18 | 2026-05-05 |
| KURT J LESKER CO | $18K | 3 | 2026-04-17 |
| PLASMABILITY LLC | $630K | 3 | 2025-09-26 |
Questions
What is solicitation N0017325P0063?
Inductively Coupled Plasma Deep Reactive Ion Etch, issued by DEPT OF DEFENSE, under NAICS 333242 (SEMICONDUCTOR MACHINERY MANUFACTURING).
What do similar contracts close for?
Comparable closed awards in this category ran from $18K to $630K, across 5 awards shown above. Those are historical results, not a forecast for this solicitation.
Is N0017325P0063 set aside?
NONE. Check the notice on SAM.gov for the eligibility language that governs.
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